Open AccessStacking Faults from Oxide Precipitates in CZ Silicon
Author(s) -
Hidetoshi Takaoka,
Jiro Oosaka,
Naohisa Inoue
Publication year - 1979
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjaps.18s1.179
Subject(s) - nucleation , silicon , stacking , stacking fault , materials science , annealing (glass) , transmission electron microscopy , oxide , precipitation , crystallography , diffusion , wafer , etching (microfabrication) , analytical chemistry (journal) , nanotechnology , chemistry , metallurgy , layer (electronics) , thermodynamics , meteorology , organic chemistry , chromatography , physics
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