Meniscus-force-mediated layer transfer technique using single-crystalline silicon films with midair cavity: Application to fabrication of CMOS transistors on plastic substrates
Author(s) -
Kohei Sakaike,
Muneki Akazawa,
Akitoshi Nakagawa,
Seiichiro Higashi
Publication year - 2015
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.54.04da08
Subject(s) - fabrication , materials science , layer (electronics) , optoelectronics , meniscus , silicon , transistor , thin film transistor , nanotechnology , optics , electrical engineering , medicine , alternative medicine , pathology , engineering , voltage , physics , incidence (geometry)
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