Open AccessPublisher's Note: “Improvements of Defects by Patterning Using Thermal Nanoimprint Lithography”
Author(s) -
Hyung Seok Park,
Ho Hyun Shin,
Man Young Sung,
Woo Beom Choi,
Seung W. Choi,
Sang Yong Park
Publication year - 2012
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.51.079206
Subject(s) - nanoimprint lithography , lithography , thermal , materials science , nanotechnology , next generation lithography , resist , optoelectronics , physics , electron beam lithography , fabrication , medicine , thermodynamics , alternative medicine , pathology , layer (electronics)
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