Open AccessInfluence of the UV Cure on Advanced Plasma Enhanced Chemical Vapour Deposition Low-kMaterials
Author(s) -
Patrick Verdonck,
Els Van Besien,
Kris Vanstreels,
Christos Trompoukis,
Adam Urbanowicz,
David De Roest,
Mikhaı̈l R. Baklanov
Publication year - 2011
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.50.05eb05
Subject(s) - curing (chemistry) , materials science , dielectric , chemical vapor deposition , wavelength , modulus , thin film , composite material , plasma , low k dielectric , analytical chemistry (journal) , optoelectronics , chemistry , nanotechnology , organic chemistry , physics , quantum mechanics
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