Open AccessEvaluation of Strained-Silicon by Electron Backscattering Pattern Measurement: Comparison Study with UV-Raman Measurement and Edge Force Model Calculation
Author(s) -
Motohiro Tomita,
Daisuke Kosemura,
Munehisa Takei,
Kohki Nagata,
Hiroaki Akamatsu,
Atsushi Ogura
Publication year - 2011
Publication title -
japanese journal of applied physics
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.487
H-Index - 129
eISSN - 1347-4065
pISSN - 0021-4922
DOI - 10.7567/jjap.50.010111
Subject(s) - materials science , raman spectroscopy , silicon , stress (linguistics) , substrate (aquarium) , electron , raman scattering , optics , optoelectronics , physics , linguistics , philosophy , oceanography , quantum mechanics , geology
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