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Structural and Magnetic Depth Profile Analysis of L10 FeNi Film by Polarized Neutron Reflectometry
Author(s) -
Tetsuro Ueno,
Kotaro Saito,
Nobuhito Inami,
Takayuki Kojima,
Masaki Mizuguchi,
Noboru Miyata,
Kazuhiro Akutsu,
Masayasu Takeda,
Kōki Takanashi,
Kanta Ono
Publication year - 2015
Publication title -
proceedings of the 2nd international symposium on science at j-parc — unlocking the mysteries of life, matter and the universe —
Language(s) - English
Resource type - Conference proceedings
DOI - 10.7566/jpscp.8.034008
Subject(s) - magnetocrystalline anisotropy , neutron reflectometry , materials science , stacking , magnetic anisotropy , magnet , reflectometry , anisotropy , fabrication , layer (electronics) , condensed matter physics , optics , neutron , nuclear magnetic resonance , magnetization , composite material , magnetic field , nuclear physics , neutron scattering , physics , time domain , computer science , computer vision , small angle neutron scattering , alternative medicine , pathology , quantum mechanics , medicine
High magnetic anisotropy is one of the requirements for the permanent magnet material. L10-ordered FeNi, which exhibits large magnetocrystalline anisotropy, is a possible candidate for rare-earth-free permanent magnet material. Because of the difficulty in producing bulk amount of L10 FeNi, alternate monolayer stacking of Fe and Ni by molecular beam epitaxy was developed [1]. In order to enhance the degree of crystalline order of the L10 structure and the magnetocrystalline anisotropy, several kinds of buffer layer have been adopted so far [2,3]. Therefore the structural and magnetic depth profile of the multilayer stacking needs to be analyzed to optimize the fabrication procedures. In this study, we performed a polarized neutron reflectometry (PNR) experiment on multilayer samples including L10-ordered FeNi

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