z-logo
open-access-imgOpen Access
Langmuir Probe Measurement for Sputtering Deposition Using Several Size of Metal Powder Target
Author(s) -
Hiroharu Kawasaki,
Tamiko Ohshima,
Takeshi Ihara,
Daichi Taniyama,
Satoshi Takeichi,
Yoshihito Yagyu,
Yoshiaki Suda
Publication year - 2014
Publication title -
proceedings of the 12th asia pacific physics conference (appc12)
Language(s) - English
Resource type - Conference proceedings
DOI - 10.7566/jpscp.1.015065
Subject(s) - sputtering , deposition (geology) , langmuir probe , materials science , metal , metallurgy , analytical chemistry (journal) , plasma , chemistry , plasma diagnostics , nanotechnology , thin film , environmental chemistry , geology , nuclear physics , physics , paleontology , sediment

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom