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Towards the Universal Transport Properties of Metal/Insulator Granular Thin Films in the Low-Field Regime with Increasing Bias Potential or Current
Author(s) -
M. A. S. Boff,
Bárbara Canto,
F. Mesquita,
Ruth Hinrichs,
L. L. Araujo,
Daniel L. Baptista,
Flavia Piegas Luce,
P.F.P. Fichtner,
G.L.F. Fraga,
L. G. Pereira
Publication year - 2014
Publication title -
progress in nanotechnology and nanomaterials
Language(s) - English
Resource type - Journals
eISSN - 2306-0034
pISSN - 2306-0026
DOI - 10.5963/pnn0304002
Subject(s) - variable range hopping , ohmic contact , condensed matter physics , materials science , insulator (electricity) , granular material , metal , electrical resistivity and conductivity , atmospheric temperature range , thin film , drop (telecommunication) , thermal conduction , nanotechnology , optoelectronics , composite material , electrical engineering , physics , metallurgy , thermodynamics , engineering , layer (electronics)
Three granular systems (Fe-Al2O3, Co-Al2O3, and Ti-SiO2) had their electrical properties analyzed in the low-field regime (eV<

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