Study on laser etching mechanism of aluminum thin film on polyimide | Zendy

Xiaoli Liu | Zendy; Yu Xiong | Zendy; Ni Ren | Zendy; Jian Yang | Zendy; Rui Wang | Zendy; Gan Wu | Zendy; Sheng Hu Wu | Zendy

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Study on laser etching mechanism of aluminum thin film on polyimide

Author(s) -

Xiaoli Liu,

Yu Xiong,

Ni Ren,

Jian Yang,

Rui Wang,

Gan Wu,

Sheng Hu Wu

Publication year - 2015

Publication title -

international journal of the physical sciences

Language(s) - English

Resource type - Journals

ISSN - 1992-1950

DOI - 10.5897/ijps2015.4261

Subject(s) - polyimide , etching (microfabrication) , materials science , aluminium , dry etching , laser , substrate (aquarium) , reactive ion etching , thin film , thermal , isotropic etching , composite material , optoelectronics , optics , nanotechnology , layer (electronics) , geology , oceanography , physics , meteorology

In order to study the laser etching mechanism for aluminum thin film on polyimide substrate, the etching process was simulated by the finite element analysis software ANSYS, and etching profile was predicted. A theoretical model was established by comparing the simulated etching results with calculated ones; it was presumed that the etching process was firstly a thermal dominant one, then a photochemical interaction dominant one, and finally a thermal one again. Key words: Laser etching, aluminum thin film, polyimide, etching profile.

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