Open AccessMicrowave Plasma Source Optimization for Thin Film Deposition Applications
Author(s) -
Mahmoud A. I. Elgarhy
Publication year - 2022
Publication title -
applied science and convergence technology
Language(s) - Uncategorized
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2022.31.2.46
Subject(s) - plasma , deposition (geology) , microwave , thin film , materials science , optoelectronics , computer science , analytical chemistry (journal) , chemistry , nanotechnology , physics , telecommunications , environmental chemistry , geology , nuclear physics , paleontology , sediment
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