Inductively Coupled Plasma Simulation Based on Electron Energy Distribution Function and Process Pressure
Author(s) -
Sora Lee,
Yejin Shon,
Dong-Gil Kim,
Deuk-Chul Kwon,
HeeHwan Choe
Publication year - 2020
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2020.29.6.157
Subject(s) - inductively coupled plasma , plasma , inductively coupled plasma atomic emission spectroscopy , materials science , atomic physics , physics , nuclear physics
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