z-logo
open-access-imgOpen Access
Inductively Coupled Plasma Simulation Based on Electron Energy Distribution Function and Process Pressure
Author(s) -
Sora Lee,
Yejin Shon,
Dong-Gil Kim,
Deuk-Chul Kwon,
HeeHwan Choe
Publication year - 2020
Publication title -
applied science and convergence technology
Language(s) - English
Resource type - Journals
eISSN - 2288-6559
pISSN - 1225-8822
DOI - 10.5757/asct.2020.29.6.157
Subject(s) - inductively coupled plasma , plasma , inductively coupled plasma atomic emission spectroscopy , materials science , atomic physics , physics , nuclear physics

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom