z-logo
open-access-imgOpen Access
One-step growth of thin film SnS with large grains using MOCVD
Author(s) -
A.J. Clayton,
Cécile Charbonneau,
Wing Chung Tsoi,
Peter J. Siderfin,
S.J.C. Irvine
Publication year - 2017
Publication title -
zenodo (cern european organization for nuclear research)
Language(s) - English
DOI - 10.5281/zenodo.1043466
Subject(s) - metalorganic vapour phase epitaxy , materials science , optoelectronics , nanotechnology , epitaxy , layer (electronics)

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom