Open AccessRoom temperature growth of ultra porous hot-wire deposited tantalum pentoxide
Author(s) -
G. Papadimitropoulos,
Maria Vasilopoulou,
Nikos Vourdas,
Dimitris N. Kouvatsos,
Kostas Giannakopoulos,
Στέλλα Κέννου,
Dimitris Davazoglou
Publication year - 2019
Publication title -
advanced materials letters
Language(s) - English
Resource type - Journals
eISSN - 0976-397X
pISSN - 0976-3961
DOI - 10.5185/amlett.2019.2283
Subject(s) - materials science , tantalum pentoxide , tantalum , scanning electron microscope , x ray photoelectron spectroscopy , amorphous solid , analytical chemistry (journal) , porosity , pentoxide , refractive index , ellipsometry , stoichiometry , chemical vapor deposition , deposition (geology) , thin film , composite material , chemical engineering , vanadium , nanotechnology , metallurgy , crystallography , optoelectronics , chemistry , engineering , organic chemistry , sediment , paleontology , biology , chromatography
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