z-logo
open-access-imgOpen Access
Effect of anneal temperature on electrical and optical properties of SnS:Ag thin films
Author(s) -
Hongjie Jia,
Shuying Cheng,
Xin-Kun Wu,
Yong-Li Yang
Publication year - 2010
Publication title -
natural science
Language(s) - English
Resource type - Journals
eISSN - 2150-4105
pISSN - 2150-4091
DOI - 10.4236/ns.2010.23030
Subject(s) - materials science , crystallite , annealing (glass) , electrical resistivity and conductivity , band gap , thin film , diffraction , vacuum evaporation , analytical chemistry (journal) , optoelectronics , optics , composite material , nanotechnology , metallurgy , chemistry , electrical engineering , physics , chromatography , engineering
SnS and Ag films were deposited on glass sub-strates by vacuum thermal evaporation tech-nique successively, and then the films were annealed at different temperatures (0-300℃) in N2 atmosphere for 2h in order to obtain sil-ver-doped SnS ( SnS:Ag ) films. The phases of SnS:Ag films were analyzed by X-ray diffraction (XRD) system, which indicated that the films were polycrystalline SnS with orthogonal struc-ture, and the crystallites in the films were ex-clusively oriented along the111direction. With the increase of the annealing temperature, the carrier concentration and mobility of the films first rose and then dropped, whereas their re-sistivity and direct band gap Eg showed the contrary trend. At the annealing temperature of 260℃, the SnS:Ag films had the best properties: the direct bandgap was 1.3 eV, the carrier con-centration was up to 1.132 × 1017 cm-3, and the resistivity was about 3.1 Ωcm

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom