Open AccessRecent Development of Si Chemical Dry Etching Technologies
Author(s) -
Toshio Hayashi
Publication year - 2013
Publication title -
journal of nanomedicine and nanotechnology
Language(s) - Uncategorized
Resource type - Journals
ISSN - 2157-7439
DOI - 10.4172/2157-7439.s15-001
Subject(s) - dry etching , nanotechnology , etching (microfabrication) , materials science , isotropic etching , environmental chemistry , engineering physics , engineering , chemistry , layer (electronics)