Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs | Zendy

Theresa. Y. Hill | Zendy; Hong Huang | Zendy

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Fabricating Pinhole-Free YSZ Sub-Microthin Films by Magnetron Sputtering for Micro-SOFCs

Author(s) -

Theresa. Y. Hill,

Hong Huang

Publication year - 2010

Publication title -

international journal of electrochemistry

Language(s) - English

Resource type - Journals

eISSN - 2090-3537

pISSN - 2090-3529

DOI - 10.4061/2011/479203

Subject(s) - materials science , yttria stabilized zirconia , cubic zirconia , sputter deposition , wafer , nanoporous , thin film , sputtering , oxide , chemical engineering , composite material , nanotechnology , metallurgy , ceramic , engineering

Submicron thin yttria stabilized zirconia (YSZ) films were prepared on a variety of substrates with different surface morphologies by magnetron sputtering followed by thermal oxidation. Pinholes were observed in the films deposited on nanoporous alumina substrates. Initial dense Y/Zr films developed nanocracks after thermal oxidation on smooth Si wafer substrates. At optimal sputtering and oxidation conditions, smooth and crack/pore-free films were achieved on Si wafer substrates. The thin YSZ films exhibited fully ionic conduction with ionic conductivities, and activation energy corroborated well with the values from commercial YSZ plates. The thin YSZ films can be utilized in Solid Oxide Fuel Cells (SOFCs) for intermediate temperature operations

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