Open AccessEUV Interferometric Lithography
Author(s) -
Hyon Chol Kang,
S. Y. Lee,
J. KIM,
Do-young. Noh
Publication year - 2011
Publication title -
physics and high technology
Language(s) - Uncategorized
Resource type - Journals
ISSN - 1225-2336
DOI - 10.3938/phit.20.002
Subject(s) - extreme ultraviolet lithography , interferometry , lithography , optics , computational lithography , materials science , multiple patterning , physics , resist , nanotechnology , layer (electronics)
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