Open AccessComparison of chelating ability of NO-, NS-, ONS-, and ONO-type Schiff base derivatives and their stability constants of Bis-complexes with copper(II)
Author(s) -
Hasan Atabey,
Esra Fındık,
Hayati Sarı,
Mustafa Ceylan
Publication year - 2014
Publication title -
turkish journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.239
H-Index - 46
eISSN - 1303-6130
pISSN - 1300-0527
DOI - 10.3906/kim-1303-65
Subject(s) - chemistry , schiff base , denticity , copper , chelation , ion , dissociation (chemistry) , stability constants of complexes , inorganic chemistry , medicinal chemistry , polymer chemistry , crystallography , organic chemistry , crystal structure
The present study includes important findings relating to the number of donor atoms, species of ligands, and stabilities of complexes. Stabilities of complexes between Cu(II) ion and NO-, NS-, ONS-, and ONO-type Schiff bases were compared. Acid-base properties of the Schiff bases were explained at 25 \pm 0.1 °C and ionic strength (I) of 0.1 M supported by NaCl. The Hyperquad computer program was used for calculation of dissociation and stability constants. The overall stability constants of their Cu(II) complexes were calculated and the various formed complexes between the Schiff bases with Cu(II) ion formulated as CuL2, CuHL2, CuH2L2, and CuH-1L2 (Cu (OH) L2). The complexes of ONS- and ONO-type tridentate ligands were more stable than those of NO- and NS-type bidentate ligands.
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