Open AccessReaction of Implanted N Isotope with SiO2 Near Si3N4-Film and SiO2-Substrate Interface
Author(s) -
N.S. Shinde,
N. Matsunami,
Osamu FUKUOKA,
Masato Tazawa,
Tetsuo Shimura,
Y. Chimi,
Masao SATAKA
Publication year - 2006
Publication title -
journal of nuclear science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.668
H-Index - 63
eISSN - 1881-1248
pISSN - 0022-3131
DOI - 10.3327/jnst.43.382
Subject(s) - substrate (aquarium) , interface (matter) , radiochemistry , materials science , isotope , chemistry , nuclear physics , physics , geology , adsorption , oceanography , gibbs isotherm
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