Open AccessSpectroscopic ellipsometry analysis of nanoporous low dielectric constant films processed via supercritical carbon dioxide for next-generation microelectronic devices
Author(s) -
Maslin Othman
Publication year - 2007
Publication title -
mospace institutional repository (university of missouri)
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.32469/10355/4879
Subject(s) - dielectric , microelectronics , nanoporous , supercritical fluid , supercritical carbon dioxide , carbon dioxide , ellipsometry , materials science , computer science , optoelectronics , engineering physics , nanotechnology , engineering , chemistry , organic chemistry , thin film
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