INFLUENCE OF DIFFERENT CURRENT DENSITY ON CHARACTERISTICS OF NiFeP NANO ALLOY THIN FILMS
Author(s) -
C. Devi,
R. Ashok Kumar
Publication year - 2018
Publication title -
rasayan journal of chemistry
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.281
H-Index - 22
eISSN - 0976-0083
pISSN - 0974-1496
DOI - 10.31788/rjc.2018.1133088
Subject(s) - alloy , nano , materials science , current (fluid) , current density , thin film , metallurgy , nanotechnology , composite material , engineering , physics , electrical engineering , quantum mechanics
In this study, electroplated NiFeP thin films were prepared with different density of current. Characterization of films was analyzed. The X-ray diffraction investigation exhibits that the electro plated NiFeP thin films consist of a face-centered cubic (FCC) phase with diffraction peaks (220), (200) and (111). The EDAX study shows that the maximum nickel content of 80.81 wt% was received for the density of current 5 mA/cm g/l. The weight % of ferrous decreases while a current density was raised. The SEM result exhibits that NiFeP thin films were shiny and uniformly deposited on the cathode surface. The Vickers Hardness Tester result shows that reduction in hardness by improving current density. Moreover, VSM studies indicate an increase in coercivity of materials and decrease in magnetization by increasing current density.
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