Investigation on Laser-annealing and Subsequent Laser-nanotexturing of Amorphous Silicon (a-Si) Films for Photovoltaic Application | Zendy

I. A. Palani | Zendy; Nilesh J. Vasa | Zendy; M. Singaperumal | Zendy; T. Okada | Zendy

Open Access

Investigation on Laser-annealing and Subsequent Laser-nanotexturing of Amorphous Silicon (a-Si) Films for Photovoltaic Application

Author(s) -

I. A. Palani,

Nilesh J. Vasa,

M. Singaperumal,

T. Okada

Publication year - 2010

Publication title -

journal of laser micro/nanoengineering

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.377

H-Index - 26

ISSN - 1880-0688

DOI - 10.2961/jlmn.2010.02.0010

Subject(s) - materials science , amorphous silicon , annealing (glass) , amorphous solid , photovoltaic system , silicon , optoelectronics , laser , green laser , optics , composite material , crystalline silicon , crystallography , electrical engineering , chemistry , physics , engineering

3+ :YAG laser is reported. The technique involved is laser annealing and subsequent laser nano texturing by over lapping the laser spot by 50% and 90% of the diameter. Experimental investigations were per- formed using third (355 nm), second (532 nm) and fundamental harmonics (1064 nm) of the pulsed Nd 3+ :YAG laser. To investigate the texturization AFM measurement was performed. Absorbance and photoconductivity measurements were performed to analyze the photovoltaic properties of thin films. The process was theoretically analyzed using a 3-D heat transformation model in FEMLAB software. 355 nm laser assisted nano-texturing with 90% overlap showed an improvement in crys- talline property and improved textured surface with a higher absorbance as compared to that of 50% overlap.

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