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Pengaruh Tekanan Parsial Oksigen Terhadap Koefisien Absorpsi Lapisan Tipis Indium Tin Oxide (ITO)
Author(s) -
Muslimin Muslimin
Publication year - 2012
Language(s) - English
DOI - 10.2685/sainsmat127432012
The process of absorption of photons with a certain energy will excite an electron from a lower energy state to condition higher energy. To determine these coefficients experimentally mainly due to the effects of optical interference patterns transmittance and reflectance. The purpose of this study was to determine the magnitude of absorption of a thin layer of In2O3: SnO2 with various levels of oxygen given at the time of deposition. The coating process performed 90 weight% In2O3 and 10 wt% SnO2 on glass substrates by sputtering. At the time, the addition of certain oxygen sputtering is 2.50%, 3.70%, 5.10%, 6.15% and 8.90% were done deposition at temperatures of 175 C. The results of the analysis observed a shift in the interference and transmittance towards shorter Korenspondensi: email: Musliminmallawangeng@yahoo.co.id

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