DOUBLE AND TRIPLE LANGMUIR PROBES MEASUREMENTS IN INDUCTIVELY COUPLED NITROGEN PLASMA | Zendy

Muhammad Yasin Naz | Zendy; Abdul Ghaffar | Zendy; N. U. Rehman | Zendy; S. Naseer | Zendy; M. Zakaullah | Zendy

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DOUBLE AND TRIPLE LANGMUIR PROBES MEASUREMENTS IN INDUCTIVELY COUPLED NITROGEN PLASMA

Author(s) -

Muhammad Yasin Naz,

Abdul Ghaffar,

N. U. Rehman,

S. Naseer,

M. Zakaullah

Publication year - 2011

Publication title -

electromagnetic waves

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.437

H-Index - 89

eISSN - 1559-8985

pISSN - 1070-4698

DOI - 10.2528/pier10110309

Subject(s) - langmuir probe , plasma , inductively coupled plasma , materials science , atomic physics , plasma diagnostics , radio frequency , electron temperature , saturation current , analytical chemistry (journal) , physics , chemistry , voltage , electrical engineering , chromatography , quantum mechanics , engineering

The double and triple Langmuir probe diagnostic systems with their necessary driving circuits are developed successfully for the characterization of laboratory built low pressure inductively coupled nitrogen plasma, generated by 13.56MHz radio frequency (RF) power supply along with an automatic impedance matching network. Using the DC properties of these two probes, the discharge plasma parameters like ion saturation current (Iio), electron temperature (kTe) and electron number density (ne) are measured at the input RF power ranging from 250 to 400W and fllling gas pressures ranging from 0.3 to 0.6mbar. An increasing trend is observed in kTe and ne with the increase of input RF power at a flxed fllling gas pressure of 0.3mbar, while a decreasing trend is observed in kTe and ne with the increase of fllling gas pressure at a flxed input RF power of 250W.

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