Open AccessObservation of Swelling Behavior of ArF Resist during Development by using QCM Method (2)
Author(s) -
Atsushi Sekiguchi,
Hiroko Konishi,
Mariko Isono
Publication year - 2012
Publication title -
journal of photopolymer science and technology
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.266
H-Index - 38
eISSN - 1349-6336
pISSN - 0914-9244
DOI - 10.2494/photopolymer.25.467
Subject(s) - swelling , resist , quartz crystal microbalance , materials science , nanotechnology , composite material , layer (electronics) , adsorption , chemistry , organic chemistry