Negative Capacitance on Silicon Avalanche Photodiodes with Deeply Buried Micropixels
Author(s) -
E. A. Jafarova,
Ziraddin Y. Sadygov,
Ali Huseyn A. Dovlatov,
Lala A. Aliyeva,
Eldar S. Tapdygov,
Kamala A. Askerova
Publication year - 2018
Publication title -
european journal of engineering and technology research
Language(s) - English
Resource type - Journals
ISSN - 2506-8016
DOI - 10.24018/ejers.2018.3.4.701
Subject(s) - capacitance , avalanche photodiode , materials science , silicon , optoelectronics , single photon avalanche diode , depletion region , photodiode , saturation (graph theory) , analytical chemistry (journal) , condensed matter physics , optics , semiconductor , chemistry , physics , electrode , chromatography , mathematics , combinatorics , detector
There have been investigated reactive properties of silicon avalanche photodiodes (MAPD- Micropixel Avalanche Photodiode) with deeply buried micropixels (amplification channels) within AC signal frequencies f= (50-500) kHz.By experiment is found out that measured capacitance of structures involving three p-n junctions in section passing through the pixels increases exponentially with Ufor (negative potential is applying to n-Si substrate) reaches maximum and at certain value Ufor= Uinv changes the sign becoming the negative capacitance (equivalent inductance).The magnitude of active component of complete conduction G grows with the applied voltage and reaches maximum value ~70 mS at Ufor= 1,0 V (f=500 kHz). There has been calculated difference in phase j appearing between current and voltage and it is shown that at Ufor=0 V the j = 80o and passes through the zero at Ufor = 0,55 V. The magnitude of negative capacitance recalculated to the inductance value with the growth of forward bias being decreased sharply tends to the saturation.
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