The effects of U.V light on mrkA, mrkD genes in local isolates of Klebsiella pneumoniae
Author(s) -
Ali Hussein Alwan,
Sura Mouaid Abass
Publication year - 2017
Publication title -
al-mustansiriyah journal of science
Language(s) - English
Resource type - Journals
eISSN - 2521-3520
pISSN - 1814-635X
DOI - 10.23851/mjs.v27i4.32
Subject(s) - klebsiella pneumoniae , microbiology and biotechnology , sputum , biofilm , isolation (microbiology) , biology , klebsiella , gene , medicine , bacteria , escherichia coli , genetics , tuberculosis , pathology
Klebsiella pneumoniae is dangerous pathogens that can cause severe diseases. This study included isolation of 50 isolates of K.pneumoniae from different clinical sources from different hospitals in Baghdad city, the number and percentage of isolates according to the sources (urine, blood, sputum, burns, ear swabs, pus, wounds and stool ) were 22(44%), 11(22%), 4(8%), 4(8%), 3(6%), 3(6%), 2(4%) and 1(2%) respectively. The ability to form biofilm was carried out using Tissue culture plate methods (-TCP-). The results showed that 80% of the isolates were producer biofilm; the genetic study was used to detect the presence of mrk A, mrk D genes that are believed to be responsible of biofilm production. The ratio was mrk A 87.5% and mrk D 50% before exposure to U.V.light to reduce to 43.7% mrk A and 18.7% mrk D in isolates after exposure to U.V.light source.
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