Application of the laser pulse method of measuring thermal diffusivity to thin alumina and silicon samples in a wide temperature range | Zendy

Nenad Milošević | Zendy

Open Access

Application of the laser pulse method of measuring thermal diffusivity to thin alumina and silicon samples in a wide temperature range

Author(s) -

Nenad Milošević

Publication year - 2010

Publication title -

thermal science

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.339

H-Index - 43

eISSN - 2334-7163

pISSN - 0354-9836

DOI - 10.2298/tsci1002417m

Subject(s) - thermal diffusivity , materials science , laser flash analysis , silicon , laser , atmospheric temperature range , range (aeronautics) , thin film , thermal , optoelectronics , composite material , optics , thermal conductivity , nanotechnology , thermodynamics , physics

Paper presents results of measuring thermal diffusivity of translucent or partially transparent thin discs of non-metals such as alumina and silicon using most widely spread experimental technique, the standard laser pulse method. Difficulties in its application to such materials are discussed. The thermal diffusivity has been measured from room temperature up to 900°C for alumina, and to 1200°C for silicon. Obtained results are analyzed and compared with available literature data and existing recommended functions.

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