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Structural characterization of the nickel thin film deposited by glad technique
Author(s) -
Jelena Potočnik,
Miloš Nenadović,
Bojan Jokić,
Svetlana Štrbac,
Zlatko Rakočević
Publication year - 2013
Publication title -
science of sintering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.309
H-Index - 25
eISSN - 1820-7413
pISSN - 0350-820X
DOI - 10.2298/sos1301061p
Subject(s) - nickel , thin film , materials science , scanning electron microscope , deposition (geology) , characterization (materials science) , chemical vapor deposition , carbon film , atomic force microscopy , composite material , metallurgy , analytical chemistry (journal) , nanotechnology , chemistry , paleontology , sediment , biology , chromatography
In this work, a columnar structure of nickel thin film has been obtained using an advanced deposition technique known as Glancing Angle Deposition. Nickel thin film was deposited on glass sample at the constant emission current of 100 mA. Glass sample was positioned 15 degrees with respect to the nickel vapor flux. The obtained nickel thin film was characterized by Force Modulation Atomic Force Microscopy and by Scanning Electron Microscopy. Analysis indicated that the formation of the columnar structure occurred at the film thickness of 1 μm, which was achieved for the deposition time of 3 hours. [Projekat Ministarstva nauke Republike Srbije, br. III45005

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