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Monitoring of the morphologic reconstruction of deposited ablation products in laser irradiation of silicon
Author(s) -
М. Vlasova,
P.A. Márquez Aguilar,
M.C. Reséndiz-González,
M. Kakazey,
V. Stetsenko,
T. Tomila,
A. V. Ragulya
Publication year - 2008
Publication title -
science of sintering
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.309
H-Index - 25
eISSN - 1820-7413
pISSN - 0350-820X
DOI - 10.2298/sos0801069v
Subject(s) - irradiation , materials science , silicon , laser ablation , impurity , ablation , microanalysis , surface finish , analytical chemistry (journal) , spectroscopy , scanning electron microscope , laser , chemical engineering , optics , composite material , optoelectronics , chemistry , physics , organic chemistry , engineering , chromatography , quantum mechanics , nuclear physics , aerospace engineering
Using electron microscopy, atomic force microscopy, X-ray microanalysis, and IR spectroscopy, it was established that, in the regime of continuous laser irradiation of silicon at P = 170 W in different gaseous atmospheres with an oxygen impurity, SiOx composite films with a complex morphology form. The main components of ablation products are clusters that form during flight of ablation products and as a result of separation of SiOx-clusters from the zone of the irradiation channel. The roughness and density of the films depend on the heating temperature of the target surface and the type of deposited clusters

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