Structure and surface composition of NiCr sputtered thin films | Zendy

S. Petrović | Zendy; N. Bundaleski | Zendy; M. Radović | Zendy; Zoran Ristić | Zendy; Goran Gligorić | Zendy; D. Peruško | Zendy; S. Zec | Zendy

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Structure and surface composition of NiCr sputtered thin films

Author(s) -

S. Petrović,

N. Bundaleski,

M. Radović,

Zoran Ristić,

Goran Gligorić,

D. Peruško,

S. Zec

Publication year - 2006

Publication title -

science of sintering

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.309

H-Index - 25

eISSN - 1820-7413

pISSN - 0350-820X

DOI - 10.2298/sos0602155p

Subject(s) - nichrome , materials science , thin film , nickel , chromium , passivation , low energy ion scattering , sputtering , solid solution , oxide , metallurgy , ion , analytical chemistry (journal) , layer (electronics) , composite material , nanotechnology , chemistry , organic chemistry , chromatography

Thin films of nichrome were deposited by d.c. sputtering of a target (80%Ni 20%Cr w.t) by Ar+ions at a working pressure of 10-1 Pa and at room temperature. The phase composition and grain size were studied by X-ray Diffraction (XRD), while the surface chemical composition was determined by Low Energy Ion Scattering (LEIS). Analysis of phase composition showed that the NiCr thin films were a solid solution of chromium in a nickel matrix with increased nickel lattice parameters. LEIS analysis showed the presence of Ni Cr and O in the first atomic layer. There is a strong suspicion that surface passivation occurred by forming Cr2O3 oxide at the surface

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