Subwavelength hole arrays with nanoapertures fabricated by scanning probe nanolithography | Zendy

Zoran Jakšić | Zendy; Milan Maksimović | Zendy; Dana Vasiljević-Radović | Zendy; Milija Sarajlić | Zendy

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Subwavelength hole arrays with nanoapertures fabricated by scanning probe nanolithography

Author(s) -

Zoran Jakšić,

Milan Maksimović,

Dana Vasiljević-Radović,

Milija Sarajlić

Publication year - 2006

Publication title -

science of sintering

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.309

H-Index - 25

eISSN - 1820-7413

pISSN - 0350-820X

DOI - 10.2298/sos0602117j

Subject(s) - materials science , nanolithography , fabrication , photoresist , substrate (aquarium) , nanometre , optoelectronics , plasmon , nanotechnology , surface plasmon , optics , layer (electronics) , physics , medicine , oceanography , alternative medicine , pathology , geology , composite material

Owing to their surface plasmon-based operation, arrays of subwavelength holes show extraordinary electromagnetic transmission and intense field localizations of several orders of magnitude. Thus they were proposed as the basic building blocks for a number of applications utilizing the enhancement of nonlinear optical effects. We designed and simulated nanometer-sized subwavelength holes using an analytical approach. In our experiments we used the scanning probe method for nanolithographic fabrication of subwavelength hole arrays in silver layers sputtered on a positive photoresist substrate. We fabricated ordered nanohole patterns with different shapes, dispositions and proportions. The smallest width was about 60 nm. We characterized the fabricated samples by atomic force microscopy

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