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By methods of X-ray diffraction, electron microscopy, atomic force microscopy and X-ray microanalysis, IR-spectroscopy the influence of IR laser irradiation (1064 nm, 175 W) on a target consisting of a SiC-Cr5Si3 ceramic composite was investigated. Irradiation of samples was carried out in N2+O2 medium at a pressure of 2 at. It was established that the surface temperature is ~ 2000 K. Silicon and silica are evaporated from the surface and during gas medium transit silicon oxide and silicon oxynitride are formed. On the base of ablative products in the zone of precipitation the film was formed

Laser treatment of SiC-C5Si3 ceramics in N2-O2 medium