Investigation of Gold Nanostructures on Silicon Using Electrochemical Deposition Method | Zendy

Abdulqader D. Faisal | Zendy; Sadek Hani Lafta | Zendy

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Investigation of Gold Nanostructures on Silicon Using Electrochemical Deposition Method

Author(s) -

Abdulqader D. Faisal,

Sadek Hani Lafta

Publication year - 2013

Publication title -

journal of al-nahrain university-science

Language(s) - English

Resource type - Journals

eISSN - 2519-0881

pISSN - 1814-5922

DOI - 10.22401/jnus.16.4.15

Subject(s) - silicon , materials science , annealing (glass) , deposition (geology) , nanostructure , nanotechnology , substrate (aquarium) , chemical engineering , electrolyte , electrode , electrochemistry , cyanide , thin film , metallurgy , chemistry , paleontology , sediment , geology , engineering , oceanography , biology

Nanostructures of gold electrodeposited on silicon (100) substrate with two electrode homemade cell were investigated. In this paper we report our experimental results of goldelectroplating using a sulfite-based electrolyte instead of toxic gold-cyanide. The used electrolyte was safe and friendly environmental. Film thickness as a function of current density and deposition rate were calculated using gravity method. An empirical formula was satisfied the expected deposition thicknesses. Deposition rate of ≈ 5-40nm/ min was achieved. Au (111) structure for gold nanofilm was characterized by XRD. Morphology of gold film deposited was investigated with AFM. Morphology of Au thin films on silicon shows nanosize particles after annealing process at 600°C.

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