Conveyorized Photoresist Stripping Replacement for Flex Circuit Fabrication | Zendy

Megan Donahue | Zendy

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Conveyorized Photoresist Stripping Replacement for Flex Circuit Fabrication

Author(s) -

Megan Donahue

Publication year - 2009

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/952451

Subject(s) - photoresist , stripping (fiber) , fabrication , flex , potassium hydroxide , materials science , chemistry , nanotechnology , computer science , composite material , telecommunications , organic chemistry , medicine , alternative medicine , layer (electronics) , pathology

A replacement conveyorized photoresist stripping system was characterized to replace the ASI photoresist stripping system. This system uses the qualified ADF-25c chemistry for the fabrication of flex circuits, while the ASI uses the qualified potassium hydroxide chemistry. The stripping process removes photoresist, which is used to protect the copper traces being formed during the etch process

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