Open AccessDirect to Digital Holography
Author(s) -
Philip R. Bingham,
K W Tobin
Publication year - 2003
Language(s) - English
Resource type - Reports
DOI - 10.2172/940257
Subject(s) - oak ridge national laboratory , holography , wafer , throughput , computer science , computer graphics (images) , engineering , computer hardware , optics , electrical engineering , telecommunications , physics , wireless , nuclear physics
In this CRADA, Oak Ridge National Laboratory (ORNL) assisted nLine Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-to-digital holographic (DDH) techniques invented at ORNL. Key components of this work included, development of the first prototype named the Visible Alpha Tool (VAT) that uses visible spectrum illumination of 532 nm, assist in design of second prototype tool named the DUV Alpha Tool (DAT) using deep UV (266 nm) illumination, and continuing support of nLine in the development of higher throughput commercial tools