Direct to Digital Holography | Zendy

Philip R. Bingham | Zendy; Kenneth W. Tobin | Zendy

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Direct to Digital Holography

Author(s) -

Philip R. Bingham,

Kenneth W. Tobin

Publication year - 2002

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/940249

Subject(s) - oak ridge national laboratory , autofocus , holography , key (lock) , ridge , wafer , computer science , digital holography , engineering , optics , physics , electrical engineering , geography , cartography , operating system , nuclear physics , focus (optics)

In this CRADA, Oak Ridge National Laboratory (ORNL) assisted nLine Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-to-digital holographic (DDH) techniques invented at ORNL. Key components of this work included, testing of DDH for detection of defects in High Aspect Ratio (HAR) structures, development of image processing techniques to enhance detection capabilities through the use of both phase and intensity, and development of methods for autofocus on the DDH tools

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