EUV reflectance characterization of the 94/304 ? flight secondary AIA mirror at beamline 6.3.2 of the Advanced Light Source | Zendy

Régina Soufli | Zendy; Eberhard Spiller | Zendy; Andrew Aquila | Zendy; Eric M. Gullikson | Zendy; David L. Windt | Zendy

Open Access

EUV reflectance characterization of the 94/304 ? flight secondary AIA mirror at beamline 6.3.2 of the Advanced Light Source

Author(s) -

Régina Soufli,

Eberhard Spiller,

Andrew Aquila,

Eric M. Gullikson,

David L. Windt

Publication year - 2006

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/928205

Subject(s) - extreme ultraviolet lithography , beamline , optics , synchrotron , angstrom , light source , extreme ultraviolet , secondary mirror , physics , materials science , chemistry , telescope , laser , primary mirror , crystallography , beam (structure)

The AIA secondary flight mirror, previously coated at Columbia University with Mg/SiC for the 303.8 {angstrom} channel and Mo/Y for the 93.9 {angstrom} channel was characterized by means of EUV reflectance measurements at beamline 6.3.2 of the Advanced Light Source (ALS) synchrotron at LBNL on January 10, 2006. Paul Boerner (LMSAL) also participated in these measurements

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research