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Atomic Force Microscope (AFM) measurements and analysis on Sagem 05R0025 secondary substrate
Author(s) -
Régina Soufli,
Sherry L. Baker,
Joseph S. Robinson
Publication year - 2006
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/928199
Subject(s) - atomic force microscopy , polishing , substrate (aquarium) , surface finish , materials science , microscope , isotropy , surface roughness , optics , analytical chemistry (journal) , chemistry , nanotechnology , physics , composite material , oceanography , chromatography , geology
The summary of Atomic Force Microscope (AFM) on Sagem 05R0025 secondary substrate: (1) 2 x 2 {micro}m{sup 2} and 10 x 10 {micro}m{sup 2} AFM measurements and analysis on Sagem 05R0025 secondary substrate at LLNL indicate rather uniform and extremely isotropic finish across the surface, with high-spatial frequency roughness {sigma} in the range 5.1-5.5 {angstrom} rms; (2) the marked absence of pronounced long-range polishing marks in any direction, combined with increased roughness in the very high spatial frequencies, are consistent with ion-beam polishing treatment on the surface. These observations are consistent with all earlier mirrors they measured from the same vendor; and (3) all data were obtained with a Digital Instruments Dimension 5000{trademark} atomic force microscope

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