Surface Passivation of Germanium Nanowires
Author(s) -
Hemant Adhikari,
Shiyu Sun,
P. Pianetta,
Chirstopher E.D. Chidsey,
Paul C. McIntyre
Publication year - 2005
Language(s) - English
Resource type - Reports
DOI - 10.2172/890831
Subject(s) - germanium , x ray photoelectron spectroscopy , nanowire , germanium oxide , passivation , oxide , hydrogen , materials science , chlorine , photoemission spectroscopy , aqueous solution , nanotechnology , analytical chemistry (journal) , chemical engineering , chemistry , optoelectronics , silicon , layer (electronics) , metallurgy , engineering , organic chemistry , chromatography
The surface of single crystal, cold-wall CVD-grown germanium nanowires was studied by synchrotron radiation photoemission spectroscopy (SR-PES) and also by conventional XPS. The as-grown germanium nanowires seem to be hydrogen terminated. Exposure to laboratory atmosphere leads to germanium oxide growth with oxidation states of Ge{sup 1+}, Ge{sup 2+}, Ge{sup 3+}, while exposure to UV light leads to a predominance of the Ge{sup 4+} oxidation state. Most of the surface oxide could be removed readily by aqueous HF treatment which putatively leaves the nanowire surface hydrogen terminated with limited stability in air. Alternatively, chlorine termination could be achieved by aq. HCl treatment of the native oxide-coated nanowires. Chlorine termination was found to be relatively more stable than the HF-last hydrogen termination
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