Growth of thick, crystalline material using dc-magnetron sputtering in Mag1 deposition chamber

We demonstrated dense, non-columnar growth of thick Mo films by moving the substrates in and out of the plasma thus allowing the surface reconstruction and by interrupting the growth with Si layers. The multilayers made this way have very smooth surface, about 1.3 nm rms high spatial frequency roughness, while also maintaining the periodicity of a reflective coating. These preliminary results hint that the surface reconstruction is an important physical process that controls the growth mechanisms. Further studies, combined with theoretical modeling, are essential to further our knowledge on how to predict and control desired microstructure for different materials