Investigation of optical loss mechanisms in oxide thin films
Author(s) -
A. F. Chow,
A. I. Kingon,
Orlando Auciello,
D. B. Poker
Publication year - 1995
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/86955
Subject(s) - materials science , thin film , amorphous solid , annealing (glass) , tetragonal crystal system , scattering , oxide , analytical chemistry (journal) , sputtering , epitaxy , oxygen , mineralogy , optics , crystallography , crystal structure , nanotechnology , metallurgy , chemistry , layer (electronics) , physics , organic chemistry , chromatography
KNbO{sub 3}, K(Ta,Nb)O{sub 3}, KTaO{sub 3}, and Ta{sub 2}O{sub 5} thin films have been grown by ion-beam sputter deposition. KNbO{sub 3} has excellent nonlinear properties for second harmonic generation; however, high optical losses are still characteristic of these films. Several loss mechanisms, such as, high angle grain boundaries, twin domains, interface and surface scattering, and oxygen vacancies can all contribute to the high losses. In order to isolate the various mechanisms, amorphous Ta{sub 2}O{sub 5} films, epitaxial cubic KTaO{sub 3} and tetragonal K(Ta,Nb)O{sub 3} films were grown on MgO and Al{sub 2}O{sub 3} substrates subjected to post-deposition annealing treatments and various oxygen pressure conditions. The optical losses and refractive indices were observed to differ depending on the substrate surface and annealing treatments. Resonant scattering experiments were performed to analyze the oxygen composition. The optical properties of these oxide thin film systems are reported and the breakdown of the loss mechanisms is addressed
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