Secondary Electron Yield Measurements of TiN coating and TiZrV getter film(LCC-128) | Zendy

F. Le Pimpec | Zendy

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Secondary Electron Yield Measurements of TiN coating and TiZrV getter film(LCC-128)

Author(s) -

F. Le Pimpec

Publication year - 2003

Publication title -

osti oai (u.s. department of energy office of scientific and technical information)

Language(s) - English

Resource type - Reports

DOI - 10.2172/826502

Subject(s) - getter , tin , titanium nitride , secondary emission , sputtering , titanium , materials science , secondary electrons , yield (engineering) , vanadium , zirconium , nitride , electron , analytical chemistry (journal) , thin film , metallurgy , chemistry , optoelectronics , physics , composite material , nuclear physics , layer (electronics) , nanotechnology , chromatography

In the beam pipe of the positron Main Damping Ring (MDR) of the Next Linear Collider (NLC), ionization of residual gases and secondary electron emission give rise to an electron cloud which can cause the loss of the circulating beam. One path to avoid the electron cloud is to ensure that the vacuum wall has low secondary emission yield and, therefore, we need to know the secondary emission yield (SEY) for candidate wall coatings. We report on SEY measurements at SLAC on titanium nitride (TiN) and titanium-zirconium-vanadium (TiZrV) thin sputter-deposited films, as well as describe our experimental setup.

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