Wafer Bonding and Epitaxial Transfer of GaSb-based Epitaxy to GaAs for Monolithic Interconnection of Thermophotovoltaic Devices
Author(s) -
C.A. Wang,
D.A. Shiau,
Peter G. Murphy,
P. W. O’Brien,
Robin Huang,
Michael K. Connors,
Allan Anderson,
D. Donetsky,
С. Г. Аникеев,
Gregory Belenky,
D. M. DePoy,
G. Nichols
Publication year - 2003
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/821870
Subject(s) - optoelectronics , epitaxy , materials science , wafer , thermophotovoltaic , gallium antimonide , wafer bonding , layer (electronics) , substrate (aquarium) , interconnection , common emitter , nanotechnology , superlattice , oceanography , geology , computer network , computer science
GaInAsSb/AlGaAsSb/InAsSb/GaSb epitaxial layers were bonded to semi-insulating GaAs handle wafers with SiO{sub x}/Ti/Au as the adhesion layer for monolithic interconnection of thermophotovoltaic (TPV) devices. Epitaxial transfer was completed by removal of the GaSb substrate, GaSb buffer, and InAsSb etch-stop layer by selective chemical etching. The SiO{sub x}/TiAu provides not only electrical isolation, but also high reflectivity and is used as an internal back-surface reflector. Characterization of wafer-bonded epitaxy by high-resolution x-ray diffraction and time-decay photoluminescence indicates minimal residual stress and enhancement in optical quality. 0.54-eV GaInAsSb cells were fabricated and monolithically interconnected in series. A 10-junction device exhibited linear voltage building with an open-circuit voltage of 1.8 V
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