Wafer-Bonded Internal Back-Surface Reflectors for Enhanced TPV Performance
Author(s) -
C.A. Wang,
Peter G. Murphy,
P. W. O’Brien,
D.A. Shiau,
Allan Anderson,
Z. L. Liau,
D. M. DePoy,
G. Nichols
Publication year - 2002
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/821703
Subject(s) - wafer , optoelectronics , reflector (photography) , materials science , layer (electronics) , wafer bonding , substrate (aquarium) , dielectric , absorption (acoustics) , optics , composite material , light source , oceanography , physics , geology
This paper discusses recent efforts to realize GaInAsSb/GaSb TPV cells with an internal back-surface reflector (BSR). The cells are fabricated by wafer bonding the GaInAsSb/GaSb device layers to GaAs substrates with a dielectric/Au reflector, and subsequently removing the GaSb substrate. The internal BSR enhances optical absorption within the device while the dielectric layer provides electrical isolation. This approach is compatible with monolithic integration of series-connected TPV cells and can mitigate the requirements of filters used for front-surface spectral control
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