Open AccessInfrared Frequency Selective Surfaces Fabricated using Optical Lithography and Phase-Shift Masks
Author(s) -
S. J. Spector,
David K. Astolfi,
Scott P. Doran,
T. M. Lyszczarz,
James E. Raynolds
Publication year - 2001
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/821683
Subject(s) - thermophotovoltaic , materials science , lithography , optics , wavelength , selective surface , optoelectronics , photolithography , fabrication , phase (matter) , ray , usable , interference lithography , visible spectrum , x ray lithography , resist , nanotechnology , physics , common emitter , medicine , alternative medicine , pathology , quantum mechanics , layer (electronics) , world wide web , computer science
A frequency selective surface (FSS) structure has been fabricated for use in a thermophotovoltaic system. The FSS provides a means for reflecting the unusable light below the bandgap of the thermophotovoltaic cell while transmitting the usable light above the bandgap. This behavior is relatively independent of the light's incident angle. The fabrication of the FSS was done using optical lithography and a phase-shift mask. The FSS cell consisted of circular slits spaced by 1100 nm. The diameters and widths of the circular slits were 870 nm and 120 nm, respectively. The FSS was predicted to pass wavelengths near 7 {micro}m and reflect wavelengths outside of this pass-band. The FSSs fabricated performed as expected with a pass-band centered near 5 {micro}m
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