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Analysis of X-Ray Diffraction as a Probe of Interdiffusion in Si/SiGe Heterostructures
Author(s) -
S. Brennan
Publication year - 2003
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/815275
Subject(s) - superlattice , diffraction , scattering , heterojunction , annealing (glass) , materials science , wafer , x ray crystallography , silicon , computational physics , condensed matter physics , analytical chemistry (journal) , optics , optoelectronics , physics , chemistry , chromatography , composite material

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