z-logo
open-access-imgOpen Access
Thin film adhesion by nanoindentation-induced superlayers. Final report
Author(s) -
W. W. Gerberich,
Alex A. Volinsky
Publication year - 2001
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/809372
Subject(s) - nanoindentation , materials science , indentation , adhesion , composite material , residual stress , thin film , radius , delamination (geology) , toughness , nanotechnology , computer science , paleontology , computer security , biology , subduction , tectonics
This work has analyzed the key variables of indentation tip radius, contact radius, delamination radius, residual stress and superlayer/film/interlayer properties on nanoindentation measurements of adhesion. The goal to connect practical works of adhesion for very thin films to true works of adhesion has been achieved. A review of this work titled ''Interfacial toughness measurements of thin metal films,'' which has been submitted to Acta Materialia, is included

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom