Open AccessMaskless, resistless ion beam lithography
Author(s) -
Qing Ji
Publication year - 2003
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Reports
DOI - 10.2172/809301
Subject(s) - ion beam lithography , maskless lithography , materials science , extreme ultraviolet lithography , lithography , ion beam , focused ion beam , next generation lithography , optoelectronics , electron beam lithography , nanotechnology , ion , optics , resist , beam (structure) , chemistry , physics , organic chemistry , layer (electronics)
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