Open AccessSynchrotron Radiation Total Reflection X-ray Fluorescence Spectroscopy for Microcontamination Analysis on Silicon Wafer Surfaces
Author(s) -
N. Takaura
Publication year - 1997
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - English
Resource type - Reports
DOI - 10.2172/784854
Subject(s) - synchrotron radiation , wafer , x ray fluorescence , materials science , total internal reflection , synchrotron , spectroscopy , silicon , analytical chemistry (journal) , detector , optoelectronics , fluorescence , optics , chemistry , physics , chromatography , quantum mechanics
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